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By C. Balanis [SOLUTIONS] [non-OCR]

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The concentration distribution proportional to the desired form is recorded on the photosensitive glass. 2. The glass is exposed by UV light to photoresist using the photomask with which the power distribution was recorded. If negative patterns are developed, the form of photoresist with the triangle form proportional to the power distribution of a photomask will remain on the glass substrate. This is melted, and the surface sphere shape is created with surface tension by the conventional method.

The photoresist surface structure of microlenses L1, L2, and L3 are formed by photolithography and transferred into a fused quartz substrate by dry etching. Surface spacing is adjusted by polishing or dry etching. Before this modification of process flow, the S2 substrate is polished after bonding to S1 and S2. The substrate S2 is formed with lens L2 and the dummy board, which is stuck with wax. 20 (3) Make L3 profile (7) Diffuse, hardening (4) Fill L3 with resin cover (8) Polish High-NA microlens fabrication process flow.

After heating above the melting temperature of the photoresist, it will become a globular form with surface tension from the cylinder form. The height and area of a ballshaped lens are controlled by the type and thickness of the photoresist used. A photoresist lens is formed on the substrate, and then it is cooled and dried. Next, the photoresist form will transfer a 3D form such as a lens to the substrate, such as glass or another material. Generally, the dry etching process is used with activated plasma gas.

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